Bridging the Sim-to-Real Gap in Semiconductor Visual Program Synthesis via Input Binarization 文章

ArXiv CS.AI2026-06-02NEWSen作者: Yusuke Ohtsubo, Kota Dohi, Koichiro Yawata, Koki Takeshita, Tatsuya Sasaki

摘要

arXiv:2606.02434v1 Announce Type: new Abstract: Precise parametric control over circuit geometry is essential for semiconductor inspection, yet obtaining sufficient real training data remains costly. Although generative models such as diffusion models and Generative Adversarial Networks (GANs) can augment training data, they cannot guarantee the nanometer-scale geometric accuracy required for metrology tasks. We propose a visual program synthesis framework in which a Vision-Language Model (VLM) converts inspection images into editable Domain-Specific Language (DSL) code describing circuit geometries, enabling controlled generation of training data with exact parameter manipulation. Because the VLM is trained solely on synthetic DSL-rendered data, a domain gap arises when processing real Scanning Electron Microscope (SEM) images. We bridge this gap with an input binarization strategy that strips SEM-specific texture and noise, letting the model focus on geometric structure.